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胡为一|深时: HdM画廊,北京

Forthcoming exhibition
2026年9月19日 - 10月31日
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胡为一 Hu Weiyi 重屏记 9号 Double Screen No. 9, 2026 古董屏风(约1920年代),金箔,阿诗水彩纸,花汁印相法,树胶重铬酸盐工艺 Anthotype and gum bichromate print on Arches watercolor paper, gold leaf, mounted on an antique folding screen (c. 1920s) 65 × 89 cm
胡为一 Hu Weiyi
重屏记 9号 Double Screen No. 9, 2026
古董屏风(约1920年代),金箔,阿诗水彩纸,花汁印相法,树胶重铬酸盐工艺 Anthotype and gum bichromate print on Arches watercolor paper, gold leaf, mounted on an antique folding screen (c. 1920s)
65 × 89 cm
观看作品

HdM画廊荣幸地宣布将于2026年9月19日呈现艺术家胡为一的最新个展《深时》。 


本次展览延续了胡为一在2021年个展《身体地理》中对摄影、材料与身体关系的探讨,并进一步将摄影的边界推向更广阔的物质、历史与地质现实。基于这一概念的创作“侵蚀”荣获2025年度“集美·阿尔勒发现奖” (Jimei x Arles Discovery Award),并于今年7月在全球最具影响力的摄影盛事法国阿尔勒摄影节(Les Rencontres d'Arles)以个展《内在的暗箱》为题展出。

 

《深时》展览以“身体”、“植物”、“山水”、“屏”为四个核心关键词,通过“深时”的宏阔尺度与现成品装置的介入,将观众引向胜景—断层、永恒—消耗、肉身—规训等多维张力之间,展开一场关于地质演变与生命存在的对话。展览将持续至2026年10月31日。

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  • 胡为一 Hu Weiyi

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